In order to study the difference between two different substrates under different plating currents, we have a relatively small current of the ZnO seed layer at 160mA (current density of 40mA / cm 2) and a current of 12mA (current density of 3mA / cm 2), are plated on copper and brass on the substrate. Then, ZnO nanoflakes were grown on copper and brass substrates by electro- hydrothermal deposi-tion methods. We have done a lot of analysis of the test pieces, including field emission scanning electron microscopy (FESEM), energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), photoluminescence (PL), and contact angles to compare the differences between the two.
ZnO nanoflakes, hydrothermal method, copper substrate, brass substrate,
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