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Characterization of Electrodeposited Copper Sulphide Thin Films

S. Thanikaikarasan| T. Mahalingam^*| A. Kathalingam | Hosun Moon | Yong Deak Kim

Department of Physics, Alagappa University, Karaikudi-630 003, India

Department of Physics, Periyar Maniammai University, Tanjore- 613 403, India

Department of Electrical and Computer Engineering, Ajou University, Suwon-443 749, Republic of Korea

Corresponding Author Email:

maha51@rediffmail.com

Received:

29 July 2009

| |

Accepted:

4 August 2009

| | Citation

v13n01a05_p029-033.pdf

OPEN ACCESS

Abstract:

Copper Sulphide (CuS) thin films were electrodeposited onto indium doped tin oxide coated conducting glass (ITO) substrates from an aqueous acidic bath containing CuSO4, Na2S2O3 and EDTA. The deposition mechanism was investigated using cyclic voltammetry. The appropriate potential region in which the formation of stoichiometric CuS thin films occurs was found to be -500 mV versus SCE and the solution pH was maintained at 3.0 ± 0.1. X-ray diffraction studies revealed that the deposited films are found to be cubic structure with preferential orientation along (111) plane. Optical absorption measurements were used to estimate the band gap value of CuS thin films deposited at different bath temperatures. Surface morphology and film composition was analyzed using an energy dispersive x-ray analysis (EDAX) set up attached with scanning electron microscope (SEM), respectively. The experimental observations are discussed in detail.

Keywords:

Copper sulphide; surface morphology; optical properties.

1. Introduction

2. Experimental Details

3. Results and Discussion

4. Conclusions

Acknowledgments

One of the authors (S.Thanikaikarasan) is highly thanks to Council of Scientific and Industrial Research (CSIR) for the award of Senior Research Fellowship (SRF) to carry out this work.

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Characterization of Electrodeposited Copper Sulphide Thin Films